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Question: 9 photoresist is a lightsensitive material applied to semiconductor wafers...

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9. Photoresist is a light-sensitive material applied to semiconductor wafers so that the circuit pattern can be imaged on to the wafer. After application, the coated wafers are baked to remove the solvent in the photoresist mixture and to harden the resist. Here are measurements of photoresist thickness (in kÅ) for eight wafers baked at two different temperatures. Assume that all of the runs were made in random order 95°C 11.176 7.089 8.097 11.739 11.291 100 °C 5.623 6.748 7.461 7.015 8.133 10.759 6.467 8.315 7.418 3.772 8.963 (a) Is there evidence to support the claim that the higher baking temperature results in wafers with a lower mean photoresist thickne (b) What is the P-value for the test conducted in part (a)? ss? Use a 0.05

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