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Hy everyone
I need this as typed format
leave q no 4
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1) Discuss the advantages and disadvantages of electron-beam lithography.

2) Discuss how forward scattering, backscattering and second electron generation impacts resolution of electron-beam lithography? What causes the proximity effect in electron-beam lithography?

3) Do thinner resists layers improve or degrade lithography resolution? Explain.

4) 6 (c ) in Chapter 9

5) What are the relative advantages of thermionic emission sources for high- resolution direct-write electron-beam lithography?

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